Applied Materials, Inc. is a
prestigious company university
established in 1967 in United States. It is represented
by 173 scientists in the AD Scientific Index. The
university’s scientists are particularly concentrated in
Engineering & Technology (100 scientists), Natural Sciences (18 scientists), and Business & Management (2 scientists).
* Total H Index Rankings
Ranking Based
On Selection: 1
Low Temperature Plasma Science and Technology
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
72
50
0.694
* Total H Index Rankings
Ranking Based
On Selection: 2
semiconductor memory
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
62
23
0.371
* Total H Index Rankings
Ranking Based
On Selection: 3
Plasma Science
Computational Modeling
Semiconductor Manufacturing
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
46
29
0.630
* Total H Index Rankings
Ranking Based
On Selection: 4
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
43
18
0.419
* Total H Index Rankings
Ranking Based
On Selection: 5
Nanocrystalline Metals
Grain Boundary Complexions
Structure-Properties Relation
Thermodynamic Modeling
Electron Microscopy
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
40
31
0.775
* Total H Index Rankings
Ranking Based
On Selection: 6
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
35
29
0.829
* Total H Index Rankings
Ranking Based
On Selection: 7
nanocomposite
thin films
TEM
Flash sintering
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
33
31
0.939
* Total H Index Rankings
Ranking Based
On Selection: 8
Technical Leadership
Electromagnetic
Semiconductor
AI
Big Data
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
27
19
0.704
* Total H Index Rankings
Ranking Based
On Selection: 9
Silicon/Silicon-Germanium Nanowires
Silicon Carbide Thin Film
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
27
13
0.481
* Total H Index Rankings
Ranking Based
On Selection: 10
semiconductor process control
CMP process control
CMP endpoint
semiconductor endpoint
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
26
17
0.654
* Total H Index Rankings
Ranking Based
On Selection: 11
III-Nitrides
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
25
19
0.760
* Total H Index Rankings
Ranking Based
On Selection: 12
AMOLED Display
LCD
Organic TFT
IGZO Oxide TFT
Low Temperature Poly Silicon (LTPS) TFT
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
23
15
0.652
* Total H Index Rankings
Ranking Based
On Selection: 13
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
22
21
0.955
* Total H Index Rankings
Ranking Based
On Selection: 14
Ion implantation and plasma material modification
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
22
9
0.409
* Total H Index Rankings
Ranking Based
On Selection: 15
Nano
strain
membrane
growth
crystal
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
21
15
0.714
* Total H Index Rankings
Ranking Based
On Selection: 16
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
21
12
0.571
* Total H Index Rankings
Ranking Based
On Selection: 17
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
18
12
0.667
* Total H Index Rankings
Ranking Based
On Selection: 18
ALD/CVD/ALE
Plasma Etching
Catalysis
Surface Science
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
18
11
0.611
* Total H Index Rankings
Ranking Based
On Selection: 19
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
18
5
0.278
* Total H Index Rankings
Ranking Based
On Selection: 20
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
17
15
0.882
* Total H Index Rankings
Ranking Based
On Selection: 21
Lithium-ion batteries
energy storage
silicon
graphene
anodes
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
17
11
0.647
* Total H Index Rankings
Ranking Based
On Selection: 22
PLD
CVD
Thin Films
Defect Magnetism
Heterostructures
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
17
10
0.588
* Total H Index Rankings
Ranking Based
On Selection: 23
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
16
13
0.813
* Total H Index Rankings
Ranking Based
On Selection: 24
Wafer Fab Equipment Engineering
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
16
10
0.625
* Total H Index Rankings
Ranking Based
On Selection: 25
Plasma sources
plasma processing
nanomanufacturing technology
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
16
9
0.563
Yang Yang
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
72
50
0.694
Christophe Chevallier
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
62
23
0.371
Shahid Rauf
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
46
29
0.630
Plasma Science
Computational Modeling
Semiconductor Manufacturing
Michael Chudzik
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
43
18
0.419
Tao Hu
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
40
31
0.775
Nanocrystalline Metals
Grain Boundary Complexions
Structure-Properties Relation
Thermodynamic Modeling
Electron Microscopy
Wen Xiao
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
35
29
0.829
Han Wang
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
33
31
0.939
Samer Banna
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
27
19
0.704
Kok-Keong (Kk) Lew
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
27
13
0.481
Thomas H Osterheld
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
26
17
0.654
semiconductor process control
CMP process control
CMP endpoint
semiconductor endpoint
Tai-Chou Papo Chen
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
25
19
0.760
Jung Bae Kim
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
23
15
0.652
AMOLED Display
LCD
Organic TFT
IGZO Oxide TFT
Low Temperature Poly Silicon (LTPS) TFT
Olivier Luere
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
22
21
0.955
Svetlana Radovanov
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
22
9
0.409
Feng Chen
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
21
15
0.714
Xinhai Han
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
21
12
0.571
Atif Noori
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
18
12
0.667
Huaxing Sun
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
18
11
0.611
Suraj Rengarajan
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
18
5
0.278
He Ren
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
17
15
0.882
Rigved Epur
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
17
11
0.647
Arkajit Roy Barman
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
17
10
0.588
Sheng-Wen(Gordon) Wang
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
16
13
0.813
Kelvin Chan
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
16
10
0.625
Jozef Kudela
Applied Materials, Inc.
Santa Clara, United States
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
16
9
0.563