Crystal S Lewis
Engineering & Technology / Nanoscience and Nanotechnology
AD Scientific Index ID: 1672615
SCORES | RANKINGS | ||||
---|---|---|---|---|---|
In Stony Brook University (1,255) | In United States (447,751) | In North America (508,021) | World (2,395,185) | ||
H Index (Total) | 10 | #674 | #243,679 | #273,969 | #958,970 |
H Index (Last 6 Years) | 8 | #675 | #246,204 | #277,134 | #??? |
H Index Last 6 years / Total Ratio
|
80% | ||||
i10 Index (Total) | 11 | #663 | #236,128 | #265,396 | #??? |
i10 Index (Last 6 Years) | 8 | #649 | #234,478 | #263,836 | #??? |
i10 Index Last 6 years / Total Ratio | 72% | ||||
Citation (Total) | 450 | #737 | #261,936 | #293,070 | #??? |
Citation (Last 6 Years) | 286 | #713 | #254,644 | #286,023 | #??? |
Citation Last 6 years / Total Ratio | 63% | ||||
Engineering & Technology * |
#207 (375) * |
#51,812 (84,351) * |
(95,544) * |
(429,036) * |
|
Nanoscience and Nanotechnology * Nanomaterials | Drug Delivery | |
#10 (11) * |
#2,138 (2,463) * |
(2,720) * |
(11,883) * |
* Nov 23, 2024 | According to Total H Index | BETA VERSION
Notice: Please note that the subject field rankings for the world, region, country, and university are in the Beta Version due to the exclusion of profiles classified under 'Others' (873.864 scientists whose branches have not been determined or updated). These rankings will adjust as profiles are updated.
Top %3 Indicator: The 'Top 3%' label indicates that a scientist ranks within the top 3% of all scientists in the AD Scientific Index for their specific subject field at the institutional, country, or world level.
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Stony Brook University Rankings
AD Scientific Index ID
1672615
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H-Index , Verified Peer Reviews, Citing Articles
ORCID ID
Scopus Author ID
H-Index, Citations, Documents
Researchgate
Research Interest Score, h-index
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Academic Degree
World: Top 10 Scientists in Engineering & Technology / Nanoscience and Nanotechnology
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Zhong Lin Wang
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Zhong Lin Wang
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Khalil Amine
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James J Collins
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Liangbing Hu
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Russell TP
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NJ Halas
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Stanislaus S Wong
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Lifeng Wang
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Matt Reuter
Matt Reuter
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Crystal S Lewis
Crystal S Lewis
Engineering & Technology
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Robert Langer
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CK Jung
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K Daniel O Leary
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Daniel N Klein
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Will M Farr
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