Lam Research Corp. is a
prestigious company university
established in 1980 in United States. It is represented
by 114 scientists in the AD Scientific Index. The
university’s scientists are particularly concentrated in
Natural Sciences (21 scientists), Engineering & Technology (17 scientists), and Business & Management (2 scientists).
* Total H Index Rankings
Ranking Based
On Selection :1
Atomic Layer Etching
Selective Etch
Semiconductor processes
Plasma Physics
Plasma Confinement
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
26
18
0.692
* Total H Index Rankings
Ranking Based
On Selection :2
Atomic Layer Deposition
Chemical Vapor Deposition
XAS
X-ray Photoelectron Spectroscopy
Spectroscopic Ellipsometry
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
19
16
0.842
* Total H Index Rankings
Ranking Based
On Selection :3
nanoscience
nanophysics
and nanotechnology
Plasma physics
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
16
15
0.938
* Total H Index Rankings
Ranking Based
On Selection :4
Atomic layer deposition
Thin films
Material growth and characterization
Nanostructures
Area-selective ALD
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
16
12
0.750
* Total H Index Rankings
Ranking Based
On Selection :5
optical metrology for semiconductor manufacturing
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
16
6
0.375
* Total H Index Rankings
Ranking Based
On Selection :6
atomic layer etching
metal intercalation in graphite
graphene on metal
STM
QMS
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
15
15
1.000
* Total H Index Rankings
Ranking Based
On Selection :7
Atomic Layer Deposition
Infiltration Synthesis
Block Copolymer Self-Assembly
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
13
13
1.000
* Total H Index Rankings
Ranking Based
On Selection :8
plasma physics
low temperature plasmas
inertial confinement fusion
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
13
12
0.923
* Total H Index Rankings
Ranking Based
On Selection :9
Atmospheric aerosols
Atmospheric Dynamics
Sunphotometer
Lidar
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
13
5
0.385
* Total H Index Rankings
Ranking Based
On Selection :10
Atomic layer deposition
Electron microscopy
Perovskites
2D Materials
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
11
10
0.909
* Total H Index Rankings
Ranking Based
On Selection :11
Advanced Semiconductor Technology
Plasma Physics
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
10
7
0.700
* Total H Index Rankings
Ranking Based
On Selection :12
atomic layer deposition (ALD and PEALD) - high-k oxides & Metals - metal-insulator-metal (MIM and MIIM) devices
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
8
7
0.875
* Total H Index Rankings
Ranking Based
On Selection :13
Atomic layer deposition
Chemical vapor deposition
Selective area deposition
Selective etch
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
8
5
0.625
* Total H Index Rankings
Ranking Based
On Selection :14
statistics
information theory
big data
semiconductor manufacturing
plasma physics
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
4
2
0.500
* Total H Index Rankings
Ranking Based
On Selection :15
Plasma physics
plasma processing
etch
deposition
thin films
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
3
2
0.667
Andreas Fischer
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
26
18
0.692
Atomic Layer Etching
Selective Etch
Semiconductor processes
Plasma Physics
Plasma Confinement
David J Mandia
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
19
16
0.842
Atomic Layer Deposition
Chemical Vapor Deposition
XAS
X-ray Photoelectron Spectroscopy
Spectroscopic Ellipsometry
Hwan Sung Choe
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
16
15
0.938
nanoscience
nanophysics
and nanotechnology
Plasma physics
Ali Haider
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
16
12
0.750
Atomic layer deposition
Thin films
Material growth and characterization
Nanostructures
Area-selective ALD
John F. Valley
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
16
6
0.375
optical metrology for semiconductor manufacturing
Ann Lii-Rosales
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
15
15
1.000
atomic layer etching
metal intercalation in graphite
graphene on metal
STM
QMS
Ashwanth Subramanian
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
13
13
1.000
Atomic Layer Deposition
Infiltration Synthesis
Block Copolymer Self-Assembly
Brett Scheiner
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
13
12
0.923
plasma physics
low temperature plasmas
inertial confinement fusion
Thulasiraman Sri
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
13
5
0.385
Atmospheric aerosols
Atmospheric Dynamics
Sunphotometer
Lidar
Steven Letourneau
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
11
10
0.909
Atomic layer deposition
Electron microscopy
Perovskites
2D Materials
Chandra Rao
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
10
7
0.700
Advanced Semiconductor Technology
Plasma Physics
Dustin Austin
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
8
7
0.875
atomic layer deposition (ALD and PEALD) - high-k oxides & Metals - metal-insulator-metal (MIM and MIIM) devices
Wenyu Zhang
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
8
5
0.625
Atomic layer deposition
Chemical vapor deposition
Selective area deposition
Selective etch
Hyunsook Lee
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
4
2
0.500
statistics
information theory
big data
semiconductor manufacturing
plasma physics
Amit Mukhopadhyay
H-Index Metrics
Total
Last 6 Years
Last 6 Years / Total
3
2
0.667
Plasma physics
plasma processing
etch
deposition
thin films