i10 Productivity
Rankings

ASML Holding/ ScientistsOthers i10 Productivity Rankings 2025

Productivity Rankings is a unique service offered only by “AD Scientific Index”. This is a ranking system derived from the i10 index in order to show the productivity of the scientist in publishing scientific articles of value. Productivity Rankings is an instrument that lists productive scientists in a given area, discipline, university, and country and can guide the development of meaningful incentives and academic policies. The world rankings, regional rankings, and university rankings of scientists in this table are developed based on the total i10 index. Additionally, click to view the special rankings based on Productivity Rankings: Scientists Last 6 years' i10 Index", Universities Total i10 Index Rankings 2025, Universities Last 6 Years i10 Index Rankings 2025 "Art and Humanities i10 Productivity Rankings" and "Social Sciences and Humanities i10 Productivity Rankings"

* Total i10 IndexRankings
Ranking Based On Selection :1
Netherlands
Vadim Banine
EUV
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
154
50
0.325
* Total i10 IndexRankings
Ranking Based On Selection :2
Netherlands
Timothy A. Brunner
Microlithography for integrated circuit production
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
111
15
0.135
* Total i10 IndexRankings
Ranking Based On Selection :3
Netherlands
Liang Wang
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
101
38
0.376
* Total i10 IndexRankings
Ranking Based On Selection :4
Netherlands
Robert Socha
lithography
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
84
14
0.167
* Total i10 IndexRankings
Ranking Based On Selection :5
Netherlands
Steven G. Hansen
photolithography
simulation
photoresist
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
70
18
0.257
* Total i10 IndexRankings
Ranking Based On Selection :6
Netherlands
Stefan Hunsche
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
67
29
0.433
* Total i10 IndexRankings
Ranking Based On Selection :7
Netherlands
Stephen D. Hsu
DUV EUV lithography
computational lithography
source mask optimization
multiple patterning
resolution enhancement technique
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
60
14
0.233
* Total i10 IndexRankings
Ranking Based On Selection :8
Netherlands
Awm (Jos) Van Schijndel
comsol
matlab
simulink
modeling
simulation
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
48
26
0.542
* Total i10 IndexRankings
Ranking Based On Selection :10
Netherlands
Wolter Siemons
Correlated electron systems
Lithography
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
44
31
0.705
* Total i10 IndexRankings
Ranking Based On Selection :11
Netherlands
Carlo Luijten
Optische lithografie
warmte en stroming
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
38
22
0.579
* Total i10 IndexRankings
Ranking Based On Selection :12
Netherlands
Robert J. Rafac
atomic spectroscopy
optical frequency standards
lithography
plasma physics
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
38
13
0.342
* Total i10 IndexRankings
Ranking Based On Selection :13
Netherlands
Michael Lercel
Semiconductor lithography
metrology
and inspection
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
35
4
0.114
* Total i10 IndexRankings
Ranking Based On Selection :14
Netherlands
Farzad Fareed|Farzad Behafarid
Thin films
optical modeling
interference coatings
Nano science and technology
Nano catalysis
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
29
0.935
* Total i10 IndexRankings
Ranking Based On Selection :15
Netherlands
Ilias Katsouras
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
25
0.806
* Total i10 IndexRankings
Ranking Based On Selection :16
Netherlands
Alex Schafgans
EUV Lithography
laser produced plasma
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
17
0.548
* Total i10 IndexRankings
Ranking Based On Selection :17
Netherlands
Inci Donmez Noyan
Thin films
MEMS
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
29
23
0.793
* Total i10 IndexRankings
Ranking Based On Selection :18
Netherlands
Steven E. Steen
Lithography
3D integration
semiconductors
process
photovoltaics
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
29
9
0.310
* Total i10 IndexRankings
Ranking Based On Selection :19
Netherlands
Dries Van Gestel
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
29
3
0.103
* Total i10 IndexRankings
Ranking Based On Selection :20
Netherlands
Michael Engel
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
28
22
0.786
* Total i10 IndexRankings
Ranking Based On Selection :21
Netherlands
Ws Christian Roelofs
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
26
18
0.692
* Total i10 IndexRankings
Ranking Based On Selection :22
Netherlands
Zeudi Mazzotta
Light Sources for sensors
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
19
0.792
* Total i10 IndexRankings
Ranking Based On Selection :23
Netherlands
Seong Chan Kim
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
17
0.708
* Total i10 IndexRankings
Ranking Based On Selection :24
Netherlands
Ye Tian
Optical Engineering
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
14
0.583
* Total i10 IndexRankings
Ranking Based On Selection :25
Netherlands
Martin Butterfield
Surface physics
EUV
Actinides
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
4
0.167
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 1
Vadim Banine
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
154
50
0.325
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 2
Timothy A. Brunner
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
111
15
0.135
Microlithography for integrated circuit production
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 3
Liang Wang
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
101
38
0.376
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 4
Robert Socha
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
84
14
0.167
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 5
Steven G. Hansen
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
70
18
0.257
photolithography
simulation
photoresist
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 6
Stefan Hunsche
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
67
29
0.433
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 7
Stephen D. Hsu
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
60
14
0.233
DUV EUV lithography
computational lithography
source mask optimization
multiple patterning
resolution enhancement technique
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 8
Awm (Jos) Van Schijndel
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
48
26
0.542
comsol
matlab
simulink
modeling
simulation
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 9
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 10
Wolter Siemons
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
44
31
0.705
Correlated electron systems
Lithography
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 11
Carlo Luijten
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
38
22
0.579
Optische lithografie
warmte en stroming
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 12
Robert J. Rafac
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
38
13
0.342
atomic spectroscopy
optical frequency standards
lithography
plasma physics
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 13
Michael Lercel
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
35
4
0.114
Semiconductor lithography
metrology
and inspection
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 14
Farzad Fareed|Farzad Behafarid
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
29
0.935
Thin films
optical modeling
interference coatings
Nano science and technology
Nano catalysis
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 15
Ilias Katsouras
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
25
0.806
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 16
Alex Schafgans
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
17
0.548
EUV Lithography
laser produced plasma
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 17
Inci Donmez Noyan
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
29
23
0.793
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 18
Steven E. Steen
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
29
9
0.310
Lithography
3D integration
semiconductors
process
photovoltaics
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 19
Dries Van Gestel
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
29
3
0.103
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 20
Michael Engel
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
28
22
0.786
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 21
Ws Christian Roelofs
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
26
18
0.692
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 22
Zeudi Mazzotta
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
19
0.792
Light Sources for sensors
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 23
Seong Chan Kim
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
17
0.708
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 24
Ye Tian
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
14
0.583
* Total i10 Index Rankings
Rankings
Ranking Based On Selection: 25
Martin Butterfield
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
4
0.167
Surface physics
EUV
Actinides