i10 Productivity
Rankings
ASML Holding ScientistsOthers i10 Productivity Rankings (Sort by last 6 years i10 Index) 2024
Productivity Rankings is a unique service offered only by “AD Scientific Index”. This is a ranking system derived from the i10 index in order to show the productivity of the scientist in publishing scientific articles of value. Productivity Rankings is an instrument that lists productive scientists in a given area, discipline, university, and country and can guide the development of meaningful incentives and academic policies. The world rankings, regional rankings, and university rankings of scientists in this table are developed based on the total i10 index. Click for "last 6 years' i10 index". Also see: Universities Rankings 2024 (Sort by : Total i10 Index) and Universities Rankings 2024 (Sort by : Last 6 Years i10 Index)
EUV
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
154
50
0.325
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
101
38
0.376
Correlated electron systems
Lithography
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
44
31
0.705
EUV
Lithography
Plasma
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
45
30
0.667
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
67
29
0.433
Thin films
optical modeling
interference coatings
Nano science and technology
Nano catalysis
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
29
0.935
comsol
matlab
simulink
modeling
simulation
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
48
26
0.542
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
25
0.806
Thin films
MEMS
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
29
23
0.793
Optische lithografie
warmte en stroming
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
38
22
0.579
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
28
22
0.786
Light Sources for sensors
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
19
0.792
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
23
19
0.826
photolithography
simulation
photoresist
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
70
18
0.257
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
26
18
0.692
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
20
18
0.900
EUV Lithography
laser produced plasma
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
17
0.548
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
17
0.708
Control systems
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
17
17
1.000
Microlithography for integrated circuit production
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
111
15
0.135
lithography
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
84
14
0.167
DUV EUV lithography
computational lithography
source mask optimization
multiple patterning
resolution enhancement technique
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
60
14
0.233
Optical Engineering
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
14
0.583
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
17
14
0.824
lithography
patterning
voltage contrast
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
14
14
1.000
Vadim Banine
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
154
50
0.325
Liang Wang
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
101
38
0.376
Wolter Siemons
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
44
31
0.705
Mark Van De Kerkhof|M van de Kerkhof, Marcus van de Kerkhof, Marcus Adrianus van de Kerkhof
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
45
30
0.667
Stefan Hunsche
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
67
29
0.433
Farzad Fareed|Farzad Behafarid
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
29
0.935
Thin films
optical modeling
interference coatings
Nano science and technology
Nano catalysis
Awm (Jos) Van Schijndel
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
48
26
0.542
Ilias Katsouras
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
25
0.806
Inci Donmez Noyan
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
29
23
0.793
Carlo Luijten
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
38
22
0.579
Michael Engel
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
28
22
0.786
Zeudi Mazzotta
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
19
0.792
Tristan Mes
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
23
19
0.826
Steven G. Hansen
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
70
18
0.257
Ws Christian Roelofs
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
26
18
0.692
Juliane Reinhardt
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
20
18
0.900
Alex Schafgans
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
17
0.548
Seong Chan Kim
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
17
0.708
Victor Dolk
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
17
17
1.000
Timothy A. Brunner
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
111
15
0.135
Robert Socha
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
84
14
0.167
Stephen D. Hsu
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
60
14
0.233
DUV EUV lithography
computational lithography
source mask optimization
multiple patterning
resolution enhancement technique
Ilaria Cardinaletti
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
17
14
0.824
Achim Woessner
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
14
14
1.000