Productivity Rankings is a unique service offered only by “AD Scientific Index”. This is a ranking system derived from the i10 index in order to show the productivity of the scientist in publishing scientific articles of value. Productivity Rankings is an instrument that lists productive scientists in a given area, discipline, university, and country and can guide the development of meaningful incentives and academic policies. The world rankings, regional rankings, and university rankings of scientists in this table are developed based on the total i10 index. Click for "last 6 years' i10 index". Also see: Universities Rankings 2024 (Sort by : Total i10 Index) and Universities Rankings 2024 (Sort by : Last 6 Years i10 Index)
EUV
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
154
50
0.325
Microlithography for integrated circuit production
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
111
15
0.135
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
101
38
0.376
lithography
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
84
14
0.167
photolithography
simulation
photoresist
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
70
18
0.257
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
67
29
0.433
DUV EUV lithography
computational lithography
source mask optimization
multiple patterning
resolution enhancement technique
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
60
14
0.233
comsol
matlab
simulink
modeling
simulation
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
48
26
0.542
EUV
Lithography
Plasma
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
45
30
0.667
Correlated electron systems
Lithography
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
44
31
0.705
Optische lithografie
warmte en stroming
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
38
22
0.579
atomic spectroscopy
optical frequency standards
lithography
plasma physics
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
38
13
0.342
Semiconductor lithography
metrology
and inspection
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
35
4
0.114
Thin films
optical modeling
interference coatings
Nano science and technology
Nano catalysis
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
29
0.935
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
25
0.806
EUV Lithography
laser produced plasma
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
17
0.548
Thin films
MEMS
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
29
23
0.793
Lithography
3D integration
semiconductors
process
photovoltaics
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
29
9
0.310
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
29
3
0.103
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
28
22
0.786
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
26
18
0.692
Light Sources for sensors
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
19
0.792
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
17
0.708
Optical Engineering
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
14
0.583
Surface physics
EUV
Actinides
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
4
0.167
Vadim Banine
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
154
50
0.325
Timothy A. Brunner
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
111
15
0.135
Liang Wang
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
101
38
0.376
Robert Socha
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
84
14
0.167
Steven G. Hansen
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
70
18
0.257
Stefan Hunsche
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
67
29
0.433
Stephen D. Hsu
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
60
14
0.233
DUV EUV lithography
computational lithography
source mask optimization
multiple patterning
resolution enhancement technique
Awm (Jos) Van Schijndel
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
48
26
0.542
Mark Van De Kerkhof|M van de Kerkhof, Marcus van de Kerkhof, Marcus Adrianus van de Kerkhof
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
45
30
0.667
Wolter Siemons
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
44
31
0.705
Carlo Luijten
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
38
22
0.579
Robert J. Rafac
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
38
13
0.342
atomic spectroscopy
optical frequency standards
lithography
plasma physics
Michael Lercel
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
35
4
0.114
Farzad Fareed|Farzad Behafarid
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
29
0.935
Thin films
optical modeling
interference coatings
Nano science and technology
Nano catalysis
Ilias Katsouras
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
25
0.806
Alex Schafgans
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
31
17
0.548
Inci Donmez Noyan
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
29
23
0.793
Steven E. Steen
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
29
9
0.310
Lithography
3D integration
semiconductors
process
photovoltaics
Dries Van Gestel
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
29
3
0.103
Michael Engel
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
28
22
0.786
Ws Christian Roelofs
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
26
18
0.692
Zeudi Mazzotta
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
19
0.792
Seong Chan Kim
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
17
0.708
Martin Butterfield
i-10 Metrics
Total
Last 6 Years
Last 6 Years / Total
24
4
0.167