Annamalai Lakshmanan

Annamalai Lakshmanan

Applied Materials, Inc. - / United States
Engineering & Technology / Electrical & Electronic Engineering
AD Scientific Index ID: 4401784
person_outline Annamalai Lakshmanan's MOST POPULAR ARTICLES
1-) Method of depositing metals using high frequency plasmaPF Ma, G Liu, A Lakshmanan, DY Wu, AK SubramaniUS Patent 9,466,524, 20162042016
2-) Method and Apparatus for Silicon Film DepositionA Lakshmanan, TT Tran, JS Sullivan, J TangUS Patent App. 12/773,497, 20111252011
3-) Method and apparatus for remote plasma source assisted silicon-containing film depositionA Lakshmanan, J Tang, DW Ho, FC Schmitt, A Tso, TK Cho, BSY Shieh, ...US Patent App. 13/634,526, 20131072013
4-) Bi-layer approach for a hermetic low dielectric constant layer for barrier applicationsA Lee, A Lakshmanan, BH Kim, LQ Xia, MYS LeUS Patent 7,091,137, 20061072006
5-) The diagnostic accuracy of spectral-domain optical coherence tomography for neovascular age-related macular degeneration: a comparison with fundus fluorescein angiographyC Wilde, M Patel, A Lakshmanan, R Amankwah, S Dhar-Munshi, ...Eye 29 (5), 602-610, 2015642015