Brian Cha

Brian Cha

Samsung Electronics, South Korea - Gyeonggi / South Korea
Engineering & Technology / Electrical & Electronic Engineering
AD Scientific Index ID: 4517455
삼성전자, 한국
person_outline Brian Cha's MOST POPULAR ARTICLES
1-) Printability and inspectability of programmed pit defects on the masks in EUV lithographyIY Kang, HS Seo, BS Ahn, DG Lee, D Kim, S Huh, CW Koh, B Cha, ...Extreme Ultraviolet (EUV) Lithography 7636, 434-442, 2010242010
2-) Particle removal challenges of EUV patterned masks for the sub-22nm HP nodeA Rastegar, S Eichenlaub, AJ Kadaksham, B Lee, M House, S Huh, ...Extreme Ultraviolet (EUV) Lithography 7636, 210-220, 2010222010
3-) Substrate effects on the characteristics of haze defect formation on the photomask surface under exposure conditionJ Choi, H Lee, J Jung, BC Cha, SG Woo, HK ChoPhotomask and Next-Generation Lithography Mask Technology XIV 6607, 77-89, 2007162007
4-) SEMATECH EUVL mask program statusH Yun, F Goodwin, S Huh, K Orvek, B Cha, A Rastegar, P KearneyPhotomask and Next-Generation Lithography Mask Technology XVI 7379, 95-102, 2009152009
5-) Real time analysis of the Haze environment trapped between the pellicle film and the mask surfaceJ Choi, S Lee, Y Cho, S Ji, BC Cha, SW Choi, WS HanPhotomask and Next-Generation Lithography Mask Technology XIII 6283, 52-58, 2006122006