Chris M Fancher

Chris M Fancher

Oak Ridge National Laboratory - Oak Ridge / United States
Engineering & Technology / Metallurgical & Materials Engineering
AD Scientific Index ID: 4421300
person_outline Chris M Fancher's MOST POPULAR ARTICLES
1-) A comprehensive study on the structural evolution of HfO 2 thin films doped with various dopantsMH Park, T Schenk, CM Fancher, ED Grimley, C Zhou, C Richter, ...Journal of Materials Chemistry C 5 (19), 4677-4690, 20172252017
2-) Breaking of macroscopic centric symmetry in paraelectric phases of ferroelectric materials and implications for flexoelectricityA Biancoli, CM Fancher, JL Jones, D DamjanovicNature materials 14 (2), 224-229, 20151822015
3-) TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin filmsPD Lomenzo, Q Takmeel, C Zhou, CM Fancher, E Lambers, ...Journal of Applied Physics 117 (13), 134105, 20151502015
4-) Si doped hafnium oxide—a “fragile” ferroelectric systemC Richter, T Schenk, MH Park, FA Tscharntke, ED Grimley, JM LeBeau, ...Advanced Electronic Materials 3 (10), 1700131, 20171792017
5-) Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodesPD Lomenzo, P Zhao, Q Takmeel, S Moghaddam, T Nishida, M Nelson, ...Journal of Vacuum Science & Technology B 32 (3), 20141472014