Conal Murray

Conal Murray

IBM Corporation - New York / United States
Natural Sciences / Physics
AD Scientific Index ID: 4463169
person_outline Conal Murray's MOST POPULAR ARTICLES
1-) Stress in thin films and coatings: Current status, challenges, and prospects Journal of Vacuum Science & Technology A 36 (2), 2018
2-) High-mobility ultrathin semiconducting films prepared by spin coating Nature 428 (6980), 299-303, 2004
3-) Sharp reduction of contact resistivities by effective Schottky barrier lowering with silicides as diffusion sources IEEE Electron Device Letters 31 (7), 731-733, 2010
4-) Liner materials for direct electrodeposition of Cu Applied Physics Letters 83 (12), 2330-2332, 2003
5-) Low-energy proton-induced single-event-upsets in 65 nm node, silicon-on-insulator, latches and memory cells IEEE Transactions on Nuclear Science 54 (6), 2474-2479, 2007