Dae Seon Kwon

Dae Seon Kwon

Interuniversity Microelectronics Centre - Leuven / Belgium
Engineering & Technology / Metallurgical & Materials Engineering
AD Scientific Index ID: 5613722
person_outline Dae Seon Kwon's MOST POPULAR ARTICLES
1-) Controlling the Electrical Characteristics of ZrO2/Al2O3/ZrO2 Capacitors by Adopting a Ru Top Electrode Grown via Atomic Layer Deposition physica status solidi (RRL)–Rapid Research Letters 13 (3), 1800454, 2019
2-) Atomic layer deposition of Ru thin films using (2, 4-dimethyloxopentadienyl)(ethylcyclopentadienyl) Ru and the effect of ammonia treatment during the deposition Journal of Materials Chemistry C 8 (21), 6993-7004, 2020
3-) Scaling the Equivalent Oxide Thickness by Employing a TiO2 Thin Film on a ZrO2–Al2O3‐Based Dielectric for Further Scaling of Dynamic Random Access Memory physica status solidi (RRL)–Rapid Research Letters 13 (10), 1900282, 2019
4-) Effect of Growth Temperature during the Atomic Layer Deposition of the SrTiO3 Seed Layer on the Properties of RuO2/SrTiO3/Ru Capacitors for Dynamic Random … ACS Applied Materials & Interfaces 10 (48), 41544-41551, 2018
5-) Improved properties of the atomic layer deposited Ru electrode for dynamic random-access memory capacitor using discrete feeding method ACS applied materials & interfaces 13 (20), 23915-23927, 2021