Deepal Wehella-Gamage

Deepal Wehella-Gamage

IBM Corporation - New York / United States
Engineering & Technology / Electrical & Electronic Engineering
AD Scientific Index ID: 4463276
person_outline Deepal Wehella-Gamage's MOST POPULAR ARTICLES
1-) High performance 45-nm SOI technology with enhanced strain, porous low-k BEOL, and immersion lithographyP Agnello, T Ivers, C Warm, R Wise, R Wachnik, D Schepis, S Sankaran, ...2006 International Electron Devices Meeting, 1-4, 20061292006
2-) A high performance 90nm SOI technology with 0.992 /spl mu/m2 6T-SRAM cellM Khare, SH Ku, RA Donaton, S Greco, C Brodsky, X Chen, A Chou, ...Digest. International Electron Devices Meeting,, 407-410, 2002642002
3-) Three-Dimensional Wafer Stacking Using Cu TSV Integrated with 45 nm High Performance SOI-CMOS Embedded DRAM Technology †P Batra, S Skordas, D LaTulipe, K Winstel, C Kothandaraman, B Himmel, ...Journal of Low Power Electronics and Applications 4 (2), 77-89, 2014382014
4-) Stress liner surrounded facetless embedded stressor mosfetBY Kim, SA Butt, X Chen, SJJ Jeng, HM Nayfeh, D Wehella-GamageUS Patent App. 11/616,730, 2008242008
5-) Reflectivity-induced variation in implant layer lithographyTC Bailey, G McIntyre, B Zhang, RP Deschner, S Mehta, W Song, HR Lee, ...Optical Microlithography XXI 6924, 1447-1457, 2008192008