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Emily Gallagher
Interuniversity Microelectronics Centre - Leuven / Belgium
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AD Scientific Index ID: 4983672
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Emily Gallagher's MOST POPULAR ARTICLES
1-)
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process K Lai, AE Rosenbluth, S Bagheri, J Hoffnagle, K Tian, D Melville, ... Optical Microlithography XXII 7274, 82-93, 2009 672009
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Intensive optimization of masks and sources for 22nm lithography AE Rosenbluth, DO Melville, K Tian, S Bagheri, J Tirapu-Azpiroz, K Lai, ... Optical Microlithography XXII 7274, 67-81, 2009 632009
3-)
Sonic cleaning with an interference signal EE Fisch, GW Gale, HF Okorn-Schmidt, WA Syverson US Patent 6,276,370, 2001 562001
4-)
Reducing edge die reflectivity in extreme ultraviolet lithographyEE Gallagher, GR McIntyreUS Patent 8,765,331, 2014552014
5-)
Structure and method for fixing phase effects on EUV maskM Burkhardt, EEF GallagherUS Patent 9,551,924, 2017502017
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