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Hariprasad Amanapu
Western Digital Corporation - / United States
Natural Sciences / Chemical Sciences
AD Scientific Index ID: 4980723
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Hariprasad Amanapu's MOST POPULAR ARTICLES
1-)
A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels R Xie, P Montanini, K Akarvardar, N Tripathi, B Haran, S Johnson, T Hook, ... 2016 IEEE international electron devices meeting (IEDM), 2.7. 1-2.7. 4, 2016 1452016
2-)
Cobalt polishing with reduced galvanic corrosion at copper/cobalt interface using hydrogen peroxide as an oxidizer in colloidal silica-based slurries BC Peethala, HP Amanapu, URK Lagudu, SV Babu Journal of The Electrochemical Society 159 (6), H582, 2012 842012
3-)
Citric acid as a complexing agent in chemical mechanical polishing slurries for cobalt films for interconnect applications R Popuri, KV Sagi, SR Alety, BC Peethala, H Amanapu, R Patlolla, ... ECS Journal of Solid State Science and Technology 6 (9), P594, 2017 612017
4-)
Investigation of percarbonate based slurry chemistry for controlling galvanic corrosion during CMP of rutheniumMC Turk, SE Rock, HP Amanapu, LG Teugels, D RoyECS Journal of Solid State Science and Technology 2 (5), P205, 2013572013
5-)
Role of guanidine carbonate and crystal orientation on chemical mechanical polishing of ruthenium filmsHP Amanapu, KV Sagi, LG Teugels, SV BabuECS Journal of Solid State Science and Technology 2 (11), P445, 2013532013
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