Harm Knoops

Harm Knoops

Eindhoven University of Technology - Eindhoven / Netherlands
Others
AD Scientific Index ID: 4365274
Technische Universiteit Eindhoven
person_outline Harm Knoops's MOST POPULAR ARTICLES
1-) Plasma atomic layer depositionHCM Knoops, K De Peuter, WMM KesselsUS Patent 9,637,823, 20174302017
2-) In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer depositionE Langereis, SBS Heil, HCM Knoops, W Keuning, MCM Van De Sanden, ...Journal of Physics D: Applied Physics 42 (7), 073001, 20094022009
3-) Conformality of plasma-assisted ALD: physical processes and modelingHCM Knoops, E Langereis, MCM Van De Sanden, WMM KesselsJournal of The Electrochemical Society 157 (12), G241, 20101912010
4-) Status and prospects of plasma-assisted atomic layer depositionH Knoops, T Faraz, K Arts, WMM KesselsJournal of Vacuum Science & Technology A 37 (3), 20192122019
5-) Atomic layer etching: what can we learn from atomic layer deposition?T Faraz, F Roozeboom, HCM Knoops, WMM KesselsECS Journal of Solid State Science and Technology 4 (6), N5023, 20151782015