Helena Castán

Universidad de Valladolid - Valladolid / Spain

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AD Scientific Index ID: 4367656

University of Valladolid

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Helena Castán's MOST POPULAR ARTICLES

1-) A comparative study of the electrical properties of TiO2 films grown by high-pressure reactive sputtering and atomic layer depositionS Duenas, H Castán, H García, E San Andrés, M Toledano-Luque, I Mártil, ...Semiconductor science and technology 20 (10), 1044, 20051002005

2-) Influence of single and double deposition temperatures on the interface quality of atomic layer deposited dielectric thin films on siliconS Dueñas, H Castán, H García, A De Castro, L Bailón, K Kukli, A Aidla, ...Journal of applied physics 99 (5), 054902, 2006612006

3-) Electrical characteristics of metal-insulator-semiconductor structures with atomic layer deposited , , and nanolaminates on different silicon substratesF Campabadal, JM Rafí, M Zabala, O Beldarrain, A Faigón, H Castán, ...Journal of Vacuum Science & Technology B, Nanotechnology and …, 2011532011

4-) Electrical properties of atomic-layer-deposited thin gadolinium oxide high-k gate dielectricsS Dueñas, H Castán, H Garcia, A Gómez, L Bailón, K Kukli, T Hatanpää, ...Journal of The Electrochemical Society 154 (10), G207, 2007462007

5-) Experimental verification of intermediate band formation on titanium-implanted siliconH Castán, E Pérez, H García, S Dueñas, L Bailón, J Olea, D Pastor, ...Journal of Applied Physics 113 (2), 2013412013

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