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Hugo Mändar
University of Tartu - Tartu / Estonia
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AD Scientific Index ID: 1604746
Тартуский университет
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Hugo Mändar's MOST POPULAR ARTICLES
1-)
Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanismJ Aarik, A Aidla, H Mändar, T UustareApplied Surface Science 172 (1-2), 148-158, 20012992001
2-)
Texture development in nanocrystalline hafnium dioxide thin films grown by atomic layer depositionJ Aarik, A Aidla, H Mändar, V Sammelselg, T UustareJournal of Crystal Growth 220 (1-2), 105-113, 20002952000
3-)
Optical characterization of HfO2 thin films grown by atomic layer depositionJ Aarik, H Mändar, M Kirm, L PungThin solid films 466 (1-2), 41-47, 20042232004
4-)
Atomic layer growth of epitaxial TiO2 thin films from TiCl4 and H2O on α-Al2O3 substratesJ Aarik, A Aidla, H Mändar, T Uustare, M Schuisky, A HårstaJournal of Crystal Growth 242 (1-2), 189-198, 20022062002
5-)
Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperaturesJ Aarik, A Aidla, H Mändar, T Uustare, K Kukli, M SchuiskyApplied surface science 173 (1-2), 15-21, 20011972001
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