NEWS
Institutional Subscription: Comprehensive Analyses to Enhance Your Global and Local Impact
New Feature: Compare Your Institution with the Previous Year
Find a Professional: Explore Experts Across 197 Disciplines in 221 Countries!
Find a Professional
Print Your Certificate
New! Young University / Institution Rankings 2025
New! Art & Humanities Rankings 2025
New! Social Sciences and Humanities Rankings 2025
Highly Cited Researchers 2025
AD
Scientific Index 2025
Scientist Rankings
University Rankings
Subject Rankings
Country Rankings
Login
Register & Pricing
insights
H-Index Rankings
insights
i10 Productivity Rankings
format_list_numbered
Citation Rankings
subject
University Subject Rankings
school
Young Universities
format_list_numbered
Top 100 Scientists
format_quote
Top 100 Institutions
format_quote
Compare & Choose
local_fire_department
Country Reports
person
Find a Professional
Jae-Seok Yang
Cadence Design Systems - / United States
Others
AD Scientific Index ID: 4964271
Registration, Add Profile,
Premium Membership
Print Your Certificate
Ranking &
Analysis
Job
Experiences (0)
Education
Information (0)
Published Books (0)
Book Chapters (0)
Articles (0)
Presentations (0)
Lessons (0)
Projects (0)
Co-Authors
Subject Leaders
Editorship, Referee &
Scientific Board (0 )
Patents /
Designs (0)
Academic Grants
& Awards (0)
Artistic
Activities (0)
Certificate / Course
/ Trainings (0)
Association &
Society Memberships (0)
Contact, Office
& Social Media
person_outline
Jae-Seok Yang's MOST POPULAR ARTICLES
1-)
Double patterning layout decomposition for simultaneous conflict and stitch minimization K Yuan, JS Yang, D Pan Proceedings of the 2009 international symposium on Physical design, 107-114, 2009 1492009
2-)
TSV stress aware timing analysis with applications to 3D-IC layout optimization JS Yang, K Athikulwongse, YJ Lee, SK Lim, DZ Pan Proceedings of the 47th Design Automation Conference, 803-806, 2010 1432010
3-)
Stress-driven 3D-IC placement with TSV keep-out zone and regularity study K Athikulwongse, A Chakraborty, JS Yang, DZ Pan, SK Lim 2010 IEEE/ACM International Conference on Computer-Aided Design (ICCAD), 669-674, 2010 1212010
4-)
A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithographyJS Yang, K Lu, M Cho, K Yuan, DZ Pan2010 15th Asia and South Pacific Design Automation Conference (ASP-DAC), 637-644, 2010832010
5-)
Overlay aware interconnect and timing variation modeling for double patterning technologyJS Yang, DZ Pan2008 IEEE/ACM International Conference on Computer-Aided Design, 488-493, 2008522008
ARTICLES
Add your articles
We use cookies to personalize our website and offer you a better experience. If you accept cookies, we can offer you special services.
Cookie Policy
Accept