Jean-Francois de Marneffe

Jean-Francois de Marneffe

Interuniversity Microelectronics Centre - Leuven / Belgium
Engineering & Technology / Metallurgical & Materials Engineering
AD Scientific Index ID: 4983649
person_outline Jean-Francois de Marneffe's MOST POPULAR ARTICLES
1-) Plasma processing of low-k dielectrics MR Baklanov, JF de Marneffe, D Shamiryan, AM Urbanowicz, H Shi, ... Journal of Applied Physics 113 (4), 4, 2013 3302013
2-) Multilayer MoS 2 growth by metal and metal oxide sulfurizationMH Heyne, D Chiappe, J Meersschaut, T Nuytten, T Conard, H Bender, ...Journal of Materials Chemistry C 4 (6), 1295-1304, 2016652016
3-) Performance improvement of tall triple gate devices with strained SiN layersN Collaert, A De Keersgieter, KG Anil, R Rooyackers, G Eneman, ...IEEE electron device letters 26 (11), 820-822, 2005652005
4-) Defect-induced bandgap narrowing in low-k dielectricsX Guo, H Zheng, SW King, VV Afanas\' ev, MR Baklanov, JF de Marneffe, ...Applied Physics Letters 107 (8), 2015502015
5-) Demonstration of fully Ni-silicided metal gates on HfO/sub 2/based high-k gate dielectrics as a candidate for low power applicationsKG Anil, A Veloso, S Kubicek, T Schram, E Augendre, JF de Marneffe, ...Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004., 190-191, 2004492004