Jeonho Kim

Jeonho Kim

Interuniversity Microelectronics Centre - Leuven / Belgium
Others
AD Scientific Index ID: 5440020
person_outline Jeonho Kim's MOST POPULAR ARTICLES
1-) Structural and electrical properties of and gate dielectrics in TaN gated nMOSCAP and nMOSFET devicesKJ Choi, JH Kim, SG Yoon, WC ShinJournal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004402004
2-) Characterization of HfO2 and HfO x N y Gate Dielectrics Grown by PE Metallorganic CVD with a TaN Gate ElectrodeKJ Choi, JH Kim, SG YoonJournal of The Electrochemical Society 151 (4), G262, 2004322004
3-) Electrical and reliability characteristics of HfO2 gate dielectric treated in N2 and NH3 plasma atmosphereJH Kim, KJ Choi, SG YoonApplied surface science 242 (3-4), 313-317, 2005282005
4-) Methods of depositing a ruthenium filmJH Kim, HS Park, SW Choi, DR Jung, CS LeeUS Patent App. 12/337,141, 2009202009
5-) Plasma nitration of HfO2 gate dielectric in nitrogen ambient for improvement of TaN/HfO2/Si performanceKJ Choi, JH Kim, SG YoonElectrochemical and solid-state letters 7 (10), F59, 2004172004