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John Bruley
IBM Corporation - New York / United States
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AD Scientific Index ID: 4464045
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John Bruley's MOST POPULAR ARTICLES
1-)
Pulsed laser deposition of diamond‐like carbon filmsDL Pappas, KL Saenger, J Bruley, W Krakow, JJ Cuomo, T Gu, ...Journal of applied physics 71 (11), 5675-5684, 19924091992
2-)
Formation of compositionally abrupt axial heterojunctions in silicon-germanium nanowiresCY Wen, MC Reuter, J Bruley, J Tersoff, S Kodambaka, EA Stach, ...Science 326 (5957), 1247-1250, 20093882009
3-)
Vapor deposition processes for amorphous carbon films with sp3 fractions approaching diamondJJ Cuomo, DL Pappas, J Bruley, JP Doyle, KL SaengerJournal of applied physics 70 (3), 1706-1711, 19913561991
4-)
Low resistance contacts including intermetallic alloy of nickel, platinum, titanium, aluminum and type IV semiconductor elementsJ Bruley, JO Chu, KL Lee, AS Ozcan, PM Solomon, JB YauUS Patent 10,269,714, 20193432019
5-)
Sharp reduction of contact resistivities by effective Schottky barrier lowering with silicides as diffusion sourcesZ Zhang, F Pagette, C D\'emic, B Yang, C Lavoie, Y Zhu, M Hopstaken, ...IEEE Electron Device Letters 31 (7), 731-733, 20103032010
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