Jon Tomas Gudmundsson

Jon Tomas Gudmundsson

University of Iceland - Reykjavík / Iceland
Others
AD Scientific Index ID: 1843483
Háskóli Íslands
person_outline Jon Tomas Gudmundsson's MOST POPULAR ARTICLES
1-) Ionized physical vapor deposition (IPVD): A review of technology and applicationsU Helmersson, M Lattemann, J Bohlmark, AP Ehiasarian, ...Thin solid films 513 (1-2), 1-24, 200611682006
2-) High power impulse magnetron sputtering dischargeJT Gudmundsson, N Brenning, D Lundin, U HelmerssonJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30 (3 …, 20126512012
3-) On the film density using high power impulse magnetron sputteringM Samuelsson, D Lundin, J Jensen, MA Raadu, JT Gudmundsson, ...Surface and Coatings Technology 205 (2), 591-596, 20103702010
4-) Physics and technology of magnetron sputtering dischargesJT GudmundssonPlasma Sources Science and Technology 29 (11), 113001, 20204402020
5-) The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering dischargeJ Bohlmark, M Lattemann, JT Gudmundsson, AP Ehiasarian, ...Thin Solid Films 515 (4), 1522-1526, 20063962006