Lakmal C Kalutarage

Lakmal C Kalutarage

Applied Materials, Inc. - Santa Clara / United States
Natural Sciences / Chemical Sciences
AD Scientific Index ID: 4402850
person_outline Lakmal C Kalutarage's MOST POPULAR ARTICLES
1-) Synthesis And Characterization Of First Row Transition Metal Complexes Containing a-Imino Alkoxides As Precursors For Deposition Of Metal Films US Patent App. 13/765,981, 2014
2-) Methods Of Depositing Flowable Films Comprising SiO and SiN US Patent App. 15/297,262, 2017
3-) Deposition Of Flowable Silicon-Containing Films US Patent App. 15/654,185, 2018
4-) Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films Coordination Chemistry Reviews 257 (23-24), 3222-3231, 2013
5-) Precursors and chemistry for the atomic layer deposition of metallic first row transition metal filmsTJ Knisley, LC Kalutarage, CH WinterCoordination Chemistry Reviews 257 (23-24), 3222-3231, 20131832013