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Lukasz Macht
ASML Holding - / Netherlands
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AD Scientific Index ID: 4965823
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Lukasz Macht's MOST POPULAR ARTICLES
1-)
Orthodox etching of HVPE-grown GaN JL Weyher, S Lazar, L Macht, Z Liliental-Weber, RJ Molnar, S Müller, ... Journal of crystal growth 305 (2), 384-392, 2007 1272007
2-)
Selective photoetching and transmission electron microscopy studies of defects in heteroepitaxial GaN JL Weyher, FD Tichelaar, HW Zandbergen, L Macht, PR Hageman Journal of applied physics 90 (12), 6105-6109, 2001 632001
3-)
An electrochemical study of photoetching of heteroepitaxial GaN: kinetics and morphology L Macht, JJ Kelly, JL Weyher, A Grzegorczyk, PK Larsen Journal of crystal growth 273 (3-4), 347-356, 2005 442005
4-)
Level sensor arrangement for lithographic apparatus and device manufacturing methodAJ Den Boef, JPH Benschop, R Brinkhof, LJ MachtUS Patent 8,842,293, 2014452014
5-)
Statistical photoluminescence of dislocations and associated defects in heteroepitaxial GaN grown by metal organic chemical vapor depositionL Macht, JL Weyher, A Grzegorczyk, PK LarsenPhysical Review B—Condensed Matter and Materials Physics 71 (7), 073309, 2005422005
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