Lukasz Macht

ASML Holding - Veldhoven / Netherlands

Others

AD Scientific Index ID: 4965823

Registration, Add Profile,
Premium Membership

Print Your Certificate

Lukasz Macht's MOST POPULAR ARTICLES

1-) Orthodox etching of HVPE-grown GaN JL Weyher, S Lazar, L Macht, Z Liliental-Weber, RJ Molnar, S Müller, ... Journal of crystal growth 305 (2), 384-392, 2007 1272007

2-) Selective photoetching and transmission electron microscopy studies of defects in heteroepitaxial GaN JL Weyher, FD Tichelaar, HW Zandbergen, L Macht, PR Hageman Journal of applied physics 90 (12), 6105-6109, 2001 632001

3-) Level sensor arrangement for lithographic apparatus and device manufacturing methodAJ Den Boef, JPH Benschop, R Brinkhof, LJ MachtUS Patent 8,842,293, 2014

4-) An electrochemical study of photoetching of heteroepitaxial GaN: kinetics and morphologyL Macht, JJ Kelly, JL Weyher, A Grzegorczyk, PK LarsenJournal of crystal growth 273 (3-4), 347-356, 2005

5-) Statistical photoluminescence of dislocations and associated defects in heteroepitaxial GaN grown by metal organic chemical vapor depositionL Macht, JL Weyher, A Grzegorczyk, PK LarsenPhysical Review B—Condensed Matter and Materials Physics 71 (7), 073309, 2005442005

ARTICLES

Add your articles