Marco I Alayo

Marco I Alayo

Universidade de São Paulo USP - São Paulo / Brazil
Natural Sciences / Physics
AD Scientific Index ID: 844883
University of São Paulo USP
person_outline Marco I Alayo's MOST POPULAR ARTICLES
1-) On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy filmsMI Alayo, I Pereyra, WL Scopel, MCA FantiniThin Solid Films 402 (1-2), 154-161, 20022022002
2-) Thick SiOxNy and SiO2 films obtained by PECVD technique at low temperaturesMI Alayo, I Pereyra, MNP CarrenoThin Solid Films 332 (1-2), 40-45, 19981141998
3-) High quality low temperature DPECVD silicon dioxideI Pereyra, MI AlayoJournal of Non-Crystalline Solids 212 (2-3), 225-231, 1997911997
4-) Study of nitrogen-rich silicon oxynitride films obtained by PECVDD Criado, I Pereyra, MI AlayoMaterials Characterization 50 (2-3), 167-171, 2003712003
5-) Local structure and bonds of amorphous silicon oxynitride thin filmsWL Scopel, MCA Fantini, MI Alayo, I PereyraThin solid films 413 (1-2), 59-64, 2002572002