Mark Lust

Mark Lust

Ohio State University - Columbus / United States
Engineering & Technology / Electrical & Electronic Engineering
AD Scientific Index ID: 5192498
person_outline Mark Lust's MOST POPULAR ARTICLES
1-) High-contrast, highly textured VO2 thin films integrated on silicon substrates using annealed Al2O3 buffer layersM Lust, S Chen, CE Wilson, J Argo, V Doan-Nguyen, N GhalichechianJournal of Applied Physics 127 (20), 205303, 2020232020
2-) Multiphysics simulation of hypersensitive microbolometer sensor using vanadium dioxide and air suspension for millimeter wave imagingS Chen, M Lust, N GhalichechianMicrosystem Technologies 27 (7), 2815-2822, 2021182021
3-) Antenna-coupled microbolometer based on VO2\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\'s non-linear properties across the metal–insulator transition regionS Chen, M Lust, N GhalichechianApplied Physics Letters 121 (20), 201901, 202272022
4-) A Vanadium Dioxide Microbolometer in the Transition Region for Millimeter Wave ImagingS Chen, M Lust, N Ghalichechian2019 IEEE International Symposium on Antennas and Propagation and USNC-URSI …, 201982019
5-) Reliability of VO2-based mmWave Switches Under 100 Million Thermal CyclesS Chen, M Lust, A Roo, N GhalichechianIEEE Transactions on Device and Materials Reliability, 202372023