Martin Kogelschatz

Martin Kogelschatz

Université Grenoble Alpes - - / France
Engineering & Technology / Electrical & Electronic Engineering
AD Scientific Index ID: 1711922
Grenoble Alpes University
person_outline Martin Kogelschatz's MOST POPULAR ARTICLES
1-) Identification of halogen containing radicals in silicon etching plasmas and density measurement by UV broad band absorption spectroscopyM Kogelschatz, G Cunge, N SadeghiJournal of Physics D: Applied Physics 37 (14), 1954, 2004652004
2-) Plasma–wall interactions during silicon etching processes in high-density HBr/Cl2/O2 plasmasG Cunge, M Kogelschatz, O Joubert, N SadeghiPlasma Sources Science and Technology 14 (2), S42, 2005642005
3-) Analysis of the chemical composition and deposition mechanism of the layer on the plasma chamber walls during silicon gate etchingM Kogelschatz, G Cunge, N SadeghiJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 22 (3 …, 2004512004
4-) Monitoring chamber walls coating deposited during plasma processes: Application to silicon gate etch processesO Joubert, G Cunge, B Pelissier, L Vallier, M Kogelschatz, E PargonJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 22 (3 …, 2004532004
5-) Influence of reactor walls on plasma chemistry and on silicon etch product densities during silicon etching processes in halogen-based plasmasG Cunge, M Kogelschatz, N SadeghiPlasma Sources Science and Technology 13 (3), 522, 2004472004