Matthew Shaw

Matthew Shaw

Intel Corporation - Kaliforniya / United States
Others
AD Scientific Index ID: 4377015
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person_outline Matthew Shaw's MOST POPULAR ARTICLES
1-) Plasma etch technologies for the development of ultra-small feature size transistor devicesD Borah, MT Shaw, S Rasappa, RA Farrell, C O\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\\'Mahony, CM Faulkner, ...Journal of Physics D: Applied Physics 44 (17), 174012, 2011932011
2-) Sub-10 nm Feature Size PS-b-PDMS Block Copolymer Structures Fabricated by a Microwave-Assisted Solvothermal ProcessD Borah, MT Shaw, JD Holmes, MA MorrisACS Applied Materials & Interfaces 5 (6), 2004-2012, 2013822013
3-) A general method for controlled nanopatterning of oxide dots: a microphase separated block copolymer platformT Ghoshal, MT Shaw, CT Bolger, JD Holmes, MA MorrisJournal of Materials Chemistry 22 (24), 12083-12089, 2012722012
4-) Monitoring PMMA Elimination by Reactive Ion Etching from a Lamellar PS-b-PMMA Thin Film by ex Situ TEM MethodsRA Farrell, N Petkov, MT Shaw, V Djara, JD Holmes, MA MorrisMacromolecules 43 (20), 8651-8655, 2010782010
5-) Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assemblyRA Farrell, NT Kinahan, S Hansel, KO Stuen, N Petkov, MT Shaw, ...Nanoscale 4 (10), 3228-3236, 2012692012