Maurizio Passacantando

Maurizio Passacantando

Università degli Studi dell'Aquila - L'Aquila / Italy
Engineering & Technology / Nanoscience and Nanotechnology
AD Scientific Index ID: 1790167
University of L'Aquila
person_outline Maurizio Passacantando's MOST POPULAR ARTICLES
1-) XPS study of the surface chemistry of L-CVD SnO2 thin films after oxidationM Kwoka, L Ottaviano, M Passacantando, S Santucci, G Czempik, ...Thin solid films 490 (1), 36-42, 20053592005
2-) XPS studies on SiOx thin filmsR Alfonsetti, L Lozzi, M Passacantando, P Picozzi, S SantucciApplied Surface Science 70, 222-225, 19932711993
3-) NO2 sensitivity of WO3 thin film obtained by high vacuum thermal evaporationC Cantalini, HT Sun, M Faccio, M Pelino, S Santucci, L Lozzi, ...Sensors and Actuators B: Chemical 31 (1-2), 81-87, 19962671996
4-) Comparison of single and binary oxide MoO3, TiO2 and WO3 sol–gel gas sensorsK Galatsis, YX Li, W Wlodarski, E Comini, G Sberveglieri, C Cantalini, ...Sensors and Actuators B: Chemical 83 (1-3), 276-280, 20022542002
5-) Investigation on the O3 sensitivity properties of WO3 thin films prepared by sol–gel, thermal evaporation and rf sputtering techniquesC Cantalini, W Wlodarski, Y Li, M Passacantando, S Santucci, E Comini, ...Sensors and Actuators B: Chemical 64 (1-3), 182-188, 20002152000