Norifumi Fujimura

Norifumi Fujimura

Osaka Metropolitan University - Osaka / Japan
Engineering & Technology / Electrical & Electronic Engineering
AD Scientific Index ID: 416581
大阪府立大学
person_outline Norifumi Fujimura's MOST POPULAR ARTICLES
1-) Control of preferred orientation for ZnOx films: control of self-textureN Fujimura, T Nishihara, S Goto, J Xu, T ItoJournal of Crystal Growth 130 (1-2), 269-279, 19938191993
2-) Epitaxially grown YMnO3 film: New candidate for nonvolatile memory devicesN Fujimura, T Ishida, T Yoshimura, T ItoApplied physics letters 69 (7), 1011-1013, 19963731996
3-) Magnetic and magneto-transport properties of ZnO: Ni filmsT Wakano, N Fujimura, Y Morinaga, N Abe, A Ashida, T ItoPhysica E: Low-Dimensional Systems and Nanostructures 10 (1-3), 260-264, 20013032001
4-) Ferroelectric properties of YMnO3 epitaxial films for ferroelectric-gate field-effect transistorsD Ito, N Fujimura, T Yoshimura, T ItoJournal of Applied Physics 93 (9), 5563-5567, 20031342003
5-) Growth mechanism of YMnO3 film as a new candidate for nonvolatile memory devicesN Fujimura, S Azuma, N Aoki, T Yoshimura, T ItoJournal of applied physics 80 (12), 7084-7088, 19961261996