Peng Xie

Peng Xie

Rochester Institute of Technology - Rochester / United States
Engineering & Technology / Metallurgical & Materials Engineering
AD Scientific Index ID: 1462558
person_outline Peng Xie's MOST POPULAR ARTICLES
1-) Resist hardening and development processes for semiconductor device manufacturingP Xie, CD Bencher, H Dai, T Michaelson, S DeshmukhUS Patent 9,411,237, 20161832016
2-) Optically tuned hardmask for multi-patterning applicationsCD Bencher, DL Diehl, H Dai, Y Cao, XU Tingjun, W Zeng, P XieUS Patent 9,177,796, 20151142015
3-) Double pattern EDA solutions for 32nm HP and beyondGE Bailey, A Tritchkov, JW Park, L Hong, V Wiaux, E Hendrickx, ...Design for Manufacturability through Design-Process Integration 6521, 476-487, 2007912007
4-) Development of an inorganic photoresist for DUV, EUV, and electron beam imagingM Trikeriotis, WJ Bae, E Schwartz, M Krysak, N Lafferty, P Xie, B Smith, ...Advances in Resist Materials and Processing Technology XXVII 7639, 120-129, 2010882010
5-) Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithographyM Krysak, M Trikeriotis, E Schwartz, N Lafferty, P Xie, B Smith, ...Advances in Resist Materials and Processing Technology XXVIII 7972, 408-413, 2011832011