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Qinghuang Lin
AD Scientific Index 2024
Engineering & Technology / Metallurgical & Materials Engineering
ASML Holding - / Netherlands
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Qinghuang Lin's MOST POPULAR ARTICLES
1-)
Method for air gap interconnect integration using photo-patternable low k material LA Clevenger, M Darnon, Q Lin, AD Lisi, SV Nitta US Patent 8,241,992, 2012 2012012
2-)
Modeling line edge roughness effects in sub 100 nanometer gate length devices P Oldiges, Q Lin, K Petrillo, M Sanchez, M Ieong, M Hargrove 2000 International Conference on Simulation of Semiconductor Processes and …, 2000 1982000
3-)
Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method Q Lin, M Angelopoulos, AD Katnani, R Sooriyakumaran US Patent 6,087,064, 2000 1512000
4-)
Measurement of bandgap energies in low-k organosilicatesMT Nichols, W Li, D Pei, GA Antonelli, Q Lin, S Banna, Y Nishi, JL ShohetJournal of Applied Physics 115 (9), 20141372014
5-)
Patternable low dielectric constant materials and their use in ULSI interconnectionQ Lin, R SooriyakumaranUS Patent 7,041,748, 20061372006
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