Qinghuang Lin

Qinghuang Lin

ASML Holding - Veldhoven / Netherlands
Engineering & Technology / Metallurgical & Materials Engineering
AD Scientific Index ID: 4965941
person_outline Qinghuang Lin's MOST POPULAR ARTICLES
1-) Method for air gap interconnect integration using photo-patternable low k material LA Clevenger, M Darnon, Q Lin, AD Lisi, SV Nitta US Patent 8,241,992, 2012 2012012
2-) Modeling line edge roughness effects in sub 100 nanometer gate length devices P Oldiges, Q Lin, K Petrillo, M Sanchez, M Ieong, M Hargrove 2000 International Conference on Simulation of Semiconductor Processes and …, 2000 1982000
3-) Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method Q Lin, M Angelopoulos, AD Katnani, R Sooriyakumaran US Patent 6,087,064, 2000 1512000
4-) Measurement of bandgap energies in low-k organosilicatesMT Nichols, W Li, D Pei, GA Antonelli, Q Lin, S Banna, Y Nishi, JL ShohetJournal of Applied Physics 115 (9), 20141432014
5-) Patternable low dielectric constant materials and their use in ULSI interconnectionQ Lin, R SooriyakumaranUS Patent 7,041,748, 20061372006