Rafaiel Ovanesyan

Rafaiel Ovanesyan

Colorado School of Mines - Golden / United States
Natural Sciences / Physics
AD Scientific Index ID: 5397254
person_outline Rafaiel Ovanesyan's MOST POPULAR ARTICLES
1-) Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlookRA Ovanesyan, EA Filatova, SD Elliott, DM Hausmann, DC Smith, ...Journal of Vacuum Science & Technology A 37 (6), 20191042019
2-) Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 PlasmaRA Ovanesyan, DM Hausmann, S AgarwalACS Applied Materials & Interfaces 7 (20), 10806-10813, 2015842015
3-) A Three-Step Atomic Layer Deposition Process for SiNx Using Si2Cl6, CH3NH2, and N2 PlasmaRA Ovanesyan, DM Hausmann, S AgarwalACS applied materials & interfaces 10 (22), 19153-19161, 2018292018
4-) Atomic Layer Deposition of SiCxNy Using Si2Cl6 and CH3NH2 PlasmaRA Ovanesyan, N Leick, KM Kelchner, DM Hausmann, S AgarwalChemistry of Materials 29 (15), 6269-6278, 2017292017
5-) Challenges in atomic layer deposition of carbon-containing silicon-based dielectricsRA Ovanesyan, DM Hausmann, S AgarwalJournal of Vacuum Science & Technology A 35 (2), 2017212017