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Rao Varanasi
Entegris - / United States
Natural Sciences / Chemical Sciences
AD Scientific Index ID: 5399417
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Rao Varanasi's MOST POPULAR ARTICLES
1-)
Progress toward developing high performance immersion compatible materials and processesK Petrillo, K Patel, R Chen, W Li, R Kwong, P Lawson, R Varanasi, ...Advances in Resist Technology and Processing XXII 5753, 52-63, 2005122005
2-)
Optimization of pitch-split double patterning phoresist for applications at the 16nm nodeSJ Holmes, C Tang, S Burns, Y Yin, R Chen, C Koay, S Kini, H Tomizawa, ...2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, 1-8, 2011112011
3-)
Rhodanine-methine as π-electron acceptor in second-order nonlinear optical chromophoresV Pushkara Rao, AKY Jen, JB CaldwellTetrahedron letters 35 (23), 199481994
4-)
Defectivity modulation in EUV resists through advanced filtration technologiesL D\'Urzo, T Umeda, T Mizuno, A Hattori, R Varanasi, A Singh, R Beera, ...Advances in Patterning Materials and Processes XXXVII 11326, 99-105, 202062020
5-)
Enhanced cleaning for the point-of-use filter and its effectiveness on wafer defectivity in immersion ArF lithography processR Varanasi, T Umeda, M Mesawich, P Connor, L JohnsonJournal of photopolymer science and technology 30 (6), 639-643, 201752017
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