Robert Hoekstra

Robert Hoekstra

Sandia National Laboratories - New Mexico / United States
Engineering & Technology / Computer Science
AD Scientific Index ID: 4415761
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person_outline Robert Hoekstra's MOST POPULAR ARTICLES
1-) An overview of the Trilinos projectMA Heroux, RA Bartlett, VE Howle, RJ Hoekstra, JJ Hu, TG Kolda, ...ACM Transactions on Mathematical Software (TOMS) 31 (3), 397-423, 200513702005
2-) Two‐dimensional modeling of high plasma density inductively coupled sources for materials processingPLG Ventzek, RJ Hoekstra, MJ KushnerJournal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 19944601994
3-) Two‐dimensional hybrid model of inductively coupled plasma sources for etchingPLG Ventzek, TJ Sommerer, RJ Hoekstra, MJ KushnerApplied physics letters 63 (5), 605-607, 19932181993
4-) Microtrenching resulting from specular reflection during chlorine etching of siliconRJ Hoekstra, MJ Kushner, V Sukharev, P SchoenbornJournal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 19981461998
5-) Integrated plasma equipment model for polysilicon etch profiles in an inductively coupled plasma reactor with subwafer and superwafer topographyRJ Hoekstra, MJ Grapperhaus, MJ KushnerJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 15 (4 …, 19971441997