Robert L Bruce

Robert L Bruce

IBM Corporation - New York / United States
Engineering & Technology / Metallurgical & Materials Engineering
AD Scientific Index ID: 4465063
person_outline Robert L Bruce's MOST POPULAR ARTICLES
1-) Nanoscale lateral displacement arrays for the separation of exosomes and colloids down to 20 nmBH Wunsch, JT Smith, SM Gifford, C Wang, M Brink, RL Bruce, RH Austin, ...Nature nanotechnology 11 (11), 936-940, 20164112016
2-) Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasmaD Metzler, RL Bruce, S Engelmann, EA Joseph, GS OehrleinJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 32 (2 …, 20141802014
3-) Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene filmsRL Bruce, F Weilnboeck, T Lin, RJ Phaneuf, GS Oehrlein, BK Long, ...Journal of Applied Physics 107 (8), 084310, 20101082010
4-) Density scaling with gate-all-around silicon nanowire MOSFETs for the 10 nm node and beyondS Bangsaruntip, K Balakrishnan, SL Cheng, J Chang, M Brink, I Lauer, ...2013 IEEE international electron devices meeting, 20.2. 1-20.2. 4, 20131252013
5-) Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasmaD Metzler, C Li, S Engelmann, RL Bruce, EA Joseph, GS OehrleinJournal of Vacuum Science & Technology A 34 (1), 20161182016