NEWS
New Feature!!!! University Subject Rankings in 12 branches
FOR SCIENTIST REGISTRATION FOR INSTITUTIONAL BULK REGISTRATION
FOR EDIT YOUR UNIVERSITY / INSTITUTION PAGE
Some differences of the AD Scientific Index
New Feature!!!! University Subject Rankings in 12 branches
List without CERN, Statistical Data etc. Only in AD Scientific Index
New Feature!!!! University Subject Rankings in 12 branches
AD
Scientific Index 2024
About Us
Methodology
Compare & Choose
Contact - FAQ
login
Login
person_add
Register
insights
i10 Productivity Rankings
format_list_numbered
Citation Rankings
school
University Rankings
subject
University Subject Rankings
insights
Subject Rankings
place
Country Rankings
format_list_numbered
Top 100 Scientists
format_quote
Top 100 Institutions
local_fire_department
Country Top Lists
Takashi Nishimura
Suzuka National College of Technology - Suzuka / Japan
Others
AD Scientific Index ID: 4625632
鈴鹿工業高等専門学校
Edit Form
Registration, Add Profile,
Premium Membership
Ranking &
Analysis
Job
Experiences (0)
Education
Information (0)
Published Books (0)
Book Chapters (0)
Articles (0)
Presentations (0)
Lessons (0)
Projects (0)
Congresses (0)
Editorship, Referee &
Scientific Board (0 )
Patents /
Designs (0)
Academic Grants
& Awards (0)
Artistic
Activities (0)
Certificate / Course
/ Trainings (0)
Association &
Society Memberships (0)
Contact, Office
& Social Media
person_outline
Takashi Nishimura's MOST POPULAR ARTICLES
1-)
Electrochemical etching of metal wires in low-stress electric contact using a liquid metal electrode to fabricate tips for scanning tunneling microscopyT Nishimura, AMA Hassan, M TomitoriApplied surface science 284, 715-719, 201392013
2-)
Adsorption State of 4,4′′-Diamino-p-terphenyl through an Amino Group Bound to Si(111)-7 × 7 Surface Examined by X-ray Photoelectron Spectroscopy and …T Nishimura, A Itabashi, A Sasahara, H Murata, T Arai, M TomitoriThe Journal of Physical Chemistry C 114 (25), 11109-11114, 201082010
3-)
Local protrusions formed on Si (111) surface by surface melting and solidification under applied tensile stressT Nishimura, M TomitoriApplied Physics Letters 109 (12), 201672016
4-)
Microanalysis of silicon protrusions with a titanium cap formed via surface melting and solidification under applied tensile stressT Nishimura, M TomitoriJapanese Journal of Applied Physics 58 (2), 025501, 201952019
5-)
Silicon protrusions with caps containing precipitates of iron silicides fabricated via liquid-phase epitaxy under a temperature distribution with a local maximum caused by …T Nishimura, M TomitoriJapanese Journal of Applied Physics 59 (8), 085501, 202042020
ARTICLES
Add your articles
We use cookies to personalize our website and offer you a better experience. If you accept cookies, we can offer you special services.
Cookie Policy
Accept