Thorsten Lill

Lam Research Corp. - Fremont / United States

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AD Scientific Index ID: 4995276

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Thorsten Lill's MOST POPULAR ARTICLES

1-) Overview of atomic layer etching in the semiconductor industry KJ Kanarik, T Lill, EA Hudson, S Sriraman, S Tan, J Marks, V Vahedi, ... Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 33 (2 …, 2015 5142015

2-) Method of etching high aspect ratio features in a dielectric layerJM Kim, KL Doan, L Ling, J Payyapilly, D Shimuzu, SD Nemani, TB LillUS Patent App. 13/656,578, 20134602013

3-) Method for fabricating a gate structure of a field effect transistorW Liu, TB Lill, DSL Mui, CD BencherUS Patent 6,924,191, 20054602005

4-) High aspect ratio etch with combination maskJ Guha, SK Reddy, K Chattopadhyay, TW Mountsier, A Eppler, T Lill, ...US Patent 9,018,103, 20154222015

5-) Integrating atomic scale processes: ALD (atomic layer deposition) and ale(atomic layer etch)K Kanarik, J Marks, H Singh, S Tan, A Kabansky, W Yang, T Kim, ...3682019

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