Tuomas Hänninen

Tuomas Hänninen

Linköping University - Linköping / Sweden
Engineering & Technology / Metallurgical & Materials Engineering
AD Scientific Index ID: 5711478
Linköpings universitet
person_outline Tuomas Hänninen's MOST POPULAR ARTICLES
1-) SiNx coatings deposited by reactive high power impulse magnetron sputtering: Process parameters influencing the residual coating stressS Schmidt, T Hänninen, J Wissting, L Hultman, N Goebbels, A Santana, ...Journal of Applied Physics 121 (17), 2017272017
2-) SiNx Coatings Deposited by Reactive High Power Impulse Magnetron Sputtering: Process Parameters Influencing the Nitrogen ContentS Schmidt, T Hanninen, C Goyenola, J Wissting, J Jensen, L Hultman, ...ACS Applied Materials & Interfaces 8 (31), 20385-20395, 2016252016
3-) Silicon oxynitride films deposited by reactive high power impulse magnetron sputtering using nitrous oxide as a single-source precursorT Hänninen, S Schmidt, J Jensen, L Hultman, H HögbergJournal of Vacuum Science & Technology A 33 (5), 2015222015
4-) Silicon carbonitride thin films deposited by reactive high power impulse magnetron sputteringT Hänninen, S Schmidt, IG Ivanov, J Jensen, L Hultman, H HögbergSurface and Coatings Technology 335, 248-256, 2018152018
5-) Hans Högberg, SiNx coatings deposited by reactive high power impulse magnetron sputtering: process parameters influencing the nitrogen contentS Schmidt, T Hänninen, C Goyenola, J Wissting, J Jensen, L Hultman, ...ACS Appl. Mater. Interfaces 8, 20385-20395, 201682016