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Vikrant Rai
Lam Research Corp. - Fremont / United States
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AD Scientific Index ID: 5455346
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Vikrant Rai's MOST POPULAR ARTICLES
1-)
Surface reaction mechanisms during ozone and oxygen plasma assisted atomic layer deposition of aluminum oxideVR Rai, V Vandalon, S AgarwalLangmuir 26 (17), 13732-13735, 20101152010
2-)
Surface reaction mechanisms during plasma-assisted atomic layer deposition of titanium dioxideVR Rai, S AgarwalThe Journal of Physical Chemistry C 113 (30), 12962-12965, 2009762009
3-)
Influence of surface temperature on the mechanism of atomic layer deposition of aluminum oxide using an oxygen plasma and ozoneVR Rai, V Vandalon, S AgarwalLangmuir 28 (1), 350-357, 2012722012
4-)
Surface reaction mechanisms during ozone-based atomic layer deposition of titanium dioxideVR Rai, S AgarwalThe Journal of Physical Chemistry C 112 (26), 9552-9554, 2008712008
5-)
Mechanism of self-catalytic atomic layer deposition of silicon dioxide using 3-aminopropyl triethoxysilane, water, and ozoneVR Rai, S AgarwalChemistry of Materials 23 (9), 2312-2316, 2011572011
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