Virginia Anderson

Virginia Anderson

University of Colorado Boulder - Boulder / United States
Engineering & Technology / Metallurgical & Materials Engineering
AD Scientific Index ID: 1775312
person_outline Virginia Anderson's MOST POPULAR ARTICLES
1-) Molybdenum Atomic Layer Deposition Using MoF6 and Si2H6 as the Reactants Chemistry of Materials 23 (7), 1668-1678, 2011
2-) Molecular Layer Deposition of Zircone and ZrO2/Zircone Alloy Films: Growth and Properties Chemical Vapor Deposition 19 (4‐6), 204-212, 2013
3-) Growth and Properties of Hafnicone and HfO2/Hafnicone Nanolaminate and Alloy Films Using Molecular Layer Deposition Techniques ACS Applied Materials & Interfaces 6 (19), 16880-16887, 2014
4-) Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures Thin Solid Films 589, 47-51, 2015
5-) Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperaturesN Nepal, VR Anderson, JK Hite, CR Eddy JrThin Solid Films 589, 47-51, 2015482015