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Yashdeep Khopkar
Applied Materials, Inc. - Santa Clara / United States
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AD Scientific Index ID: 5410665
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Yashdeep Khopkar's MOST POPULAR ARTICLES
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Resist outgassing contamination growth results using both photon and electron exposuresG Denbeaux, Y Kandel, G Kane, D Alvardo, M Upadhyaya, Y Khopkar, ...Extreme Ultraviolet (EUV) Lithography IV 8679, 126-133, 2013122013
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Mass spectrometer characterization of reactions in photoresists exposed to extreme ultraviolet radiationC Mbanaso, S Kruger, C Higgins, Y Khopkar, A Antohe, B Cardineau, ...Extreme Ultraviolet (EUV) Lithography II 7969, 807-815, 2011102011
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Wavelength dependence of carbon contamination on mirrors with different capping layersP Thomas, L Yankulin, Y Khopkar, R Garg, C Mbanaso, A Antohe, YJ Fan, ...Extreme Ultraviolet (EUV) Lithography 7636, 622-629, 201052010
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Perylenetetracarboxylic diimide (PTCDI) nanowires for sensing ethyl acetate in wineY Khopkar, A Kojtari, D Swearer, S Zivanovic, HF JiJournal of nanoscience and nanotechnology 14 (9), 6786-6788, 201442014
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Single Mesowire Transistor From Perylene Tetracarboxylic DiimideMA Koorie, Y Khopkar, HF Ji, SR ZivanovicIEEE transactions on nanotechnology 11 (3), 448-450, 201232012
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