Yu Sheng Wang

Taiwan Semiconductor Manufacturing Company Ltd. - Hsinchu / Taiwan

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AD Scientific Index ID: 4544053

台湾半导体制造公司有限公司

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Yu Sheng Wang's MOST POPULAR ARTICLES

1-) The influence of abrasive particle size in copper chemical mechanical planarizationKH Wei, YS Wang, CP Liu, KW Chen, YL Wang, YL ChengSurface and Coatings Technology 231, 543-545, 2013302013

2-) An electroplating method for copper plane twin boundary manufacturingYS Wang, WH Lee, SC Chang, JN Nian, YL WangThin Solid Films 544, 157-161, 2013292013

3-) Cleaning methodology of small residue defect with surfactant in copper chemical mechanical polishing post-cleaningKH Wei, CC Hung, YS Wang, CP Liu, KW Chen, YL WangThin Solid Films 618, 77-80, 2016242016

4-) Under-layer behavior study of low resistance Ta/TaNx barrier filmYS Wang, CC Hung, WH Lee, SC Chang, YL WangThin Solid Films 516 (16), 5241-5243, 2008252008

5-) A study of trimethylsilane (3MS) and tetramethylsilane (4MS) based α-SiCN: H/α-SiCO: H diffusion barrier filmsSW Chen, YS Wang, SY Hu, WH Lee, CC Chi, YL WangMaterials 5 (3), 377-384, 2012242012

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